Tech Talk: Dr. Harry Levinson, HJL Lithography

Harry Levinson of HJL Lithography summarizes key developments at SPIE-PUV. Among these include updates on high-NA EUV, stitching, large-format masks, curvilinear mask features, multi-beam mask writers, inline pixel-level dose correction (PLDC), low-n masks, pellicles, actinic pattern mask inspection, EUV resists, stochastics, and much more.