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Chuck Cleaning Wafer: Etch Clean by International Test Solutions
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Plasma Etch tools are critical systems in the semiconductor device manufacturing process. The etch chambers require regular manual cleaning at scheduled intervals. Sometimes contamination on the wafer chuck can require cleaning prior to the scheduled time.
The Chuck Cleaning Wafer, or CCW, from International Test Solutions is an innovative turn-key product for efficient chuck cleaning without unscheduled downtime.
The Chuck Cleaning Wafer, or CCW, from International Test Solutions is an innovative turn-key product for efficient chuck cleaning without unscheduled downtime.