ASU Core Facilities Equipment Showcase: Veeco Savannah Atomic Layer Deposition System

The ASU Core Research Facilities house state-of-the-art equipment, including the Veeco Savannah ALD, an instrument used for precise and uniform film coating. It achieves remarkable consistency, even within pores and cavities, crucial for semiconductor and solar applications.

The Savannah accommodates substrate sizes up to M12 and features a maximum processing temperature of 350°C, an ozone generator for varied materials processing and six precursor inlets to maximize deposition capabilities.

With typical uniformity of less than 1% for Aluminum oxide (Al₂O₃), the Savannah ALD is pivotal in developing next-generation processes, from catalytic research to creating advanced electronic structures. This instrument's atomic-scale precision underscores its significance in propelling diverse technological advancements.

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Thumbs up from the original Savannah designer!